カテゴリー:結晶・材料

■よくあるお問い合わせ■  ※※※商品名等の“1sp”は片面研磨、“2sp”は両面研磨を表しております※※※

Su01-1セラミック基板 Su02-122単結晶基板
Su03-1金属基板 Su05-1ターゲット材料・蒸着材料
Su06-1薄膜基板  

Knowledge Center

           MTI Corporation


Knowledge on Crystal Growth

●Verneuil method (doc) (Flamge fusion)
●Czochralski method (doc) (Pulling up)
●Bridgman method (doc) (Pulling down)
●Kryopulos method (doc)
●Bagdasarov (doc) (HDC method)
●LEC method (doc) (Liquid Encapsulated Czochralski)
The development of Crystal Growth Technology (pdf) — Hans J. Scheel, Chairman of IOCG (Excellent review on Crystal growth history and future)

Knowledge on Thin Film

How to make Thin Film by dip coating
●Definition of dip coating (wiki)
●Crystallization Study of SrTio (pdf)

How to deopiste thin film by thermo-evaporation
●Thin Film Deposition & Vacuum Technology (pdf)

Knowledge on Film Growth

●Principle of Thin Film Deposition (ppt)
●Plasma sputter coating (pdf)
●Chemical vapor deposition technique (CVD) (wiki)
●MOCVD technology and material growth
●Physical vapor deposition technique (PVD) for growing nanostructures by tube furnace
●Laser ablation technique
●Growth of ZnO nano-rod by VLS process in tube furnace (pdf)
●Growth of Si nano-wire by VLS process (pdf)

 

 


ページ上部へ戻る